Technoorg Linda Ltd. Co. is the one of the world's leading manufacturers of instruments and technologies to extend the operation of ion technology based specimen preparation and depth profiling. Technoorg Linda's products are fully compatible with all brands of electron microscopes and cover the entire range of the thinning process from prepreparation to ion milling and endpolishing. The applications are suited for many purposes in the fields of Material Research, Geology, Semiconductor and Optical Industry, like multilayer systems, semiconductors, diamond, composite materials, metals, ceramics, glasses, rocks and minerals. The Technoorg Linda brand name is respected throughout the leading scientific community and has been synonymous with high-precision instruments and world-leading quality of endpolishing.

For details please visit website www.technoorg.hu

Tousimis Research Corporation (formerly Biodynamics Research Corporation) was organized in 1962 under the laws of the District of Columbia. Our goal was, and still is, to develop and perfect instrumentation and products to be used in laboratories where similar studies are carried out. This idea (which has been the basis for our company for the past 49 years) was that of scientific pioneer Dr. A. J. Tousimis, President and CEO of tousimis research corporation. Tousimis products are the best available and are known for their reliability and highest possible quality so that your experiments are the variables, not your chemicals and instrumentation.

Few of the typical applications where Tousimis critical point dryers are used by hundreds of MEMS labs worldwide are RF switches, cantilevers, micro robots, inkjet nozzle, shock sensors, coupled oscillators, micro platforms, actuators, hinges, drives, ratchet MEMS devices, carbon nanotubes, sol-gel, e-beam resist drying, biological sample drying for SEM observation etc.

For more details, please Contact MCube Technologies or visit Tousimis Research Corporation website

TVIPS manufactures high-performance camera systems for TEM with resolutions from 1 to 64 Megapixels. A powerful Windows XP based image processing platform allows seamless integration into any type of microscope and flexible custom solutions for biological and materials science applications, e.g. automatic electron tomography.

The line of business solar cell production and solar cell module production is one of the aim industries for ATMvision AG. Both for the production and for the quality control of the solar cells ATMvision AG develops standard products for the inspection, measurement and production control by means of image processing systems. The product - Solar cell as an alternative energy source has developed into a decisive impulse giver of technological, scientific and social progress. Examples of it are numerous use and possible applications.

ATMvision AG offers a multitude of technologies and applications standardized in the production of solar cells, handling as well as in the module assembly on. As a specialized supplier of 3-D products in the image processing technologies, we managed to complement our 2-D product range to undo the applications of the solar industry consistently and continuously as well as cost optimally.

XACTIX, Inc. develops and produces equipment used for releasing micro electromechanical systems (MEMS), failure analysis and dry isotropic etching of transitional metals such as Mo, Ti, Ta, W, TiN and TaN using Xenon Di-Fluoride (XeF2).

XACTIX is the manufacturer of the Xetch® xenon di-fluoride (XeF2) etching systems, the X4 Series™ for advanced R&D & pilot production/ commercial customers, the e1 Series™ for university/ R&D customers, the CVE module for batch processing for high volume production.

These highly selective dry isotropic etching tools are popular in the MEMS community due to high selectivity to silicon versus many standard films including photoresist, silicon dioxide, silicon nitride, and aluminum. Being a vapor phase etchant, XeF2 avoids many of the problems typically associated with wet or plasma etch processes. The Xetch® systems are particularly well suited for MEMS release, but are certainly not limited to MEMS applications and are useful for many applications where highly selective isotropic silicon etching is required. Xactix has over 100 machines installed worldwide is prestigious laboratories and manufacturing companies.

For more details, please Contact MCube Technologies or visit Xactix Incorporated website

MTI Instruments' semiconductor wafer metrology tools consist of a complete product portfolio of wafer measurement systems for virtually any material including Si, GaAs, Ge and InP. From manual to semi-automated systems, the Proforma line of wafer metrology tools is ideal for wafer thickness, bow, warp, resistivity, site and global flatness measurement.
MTII also offers a variety of manual, semi-automated and fully automated miniature compression and tensile testers designed for use in Scanning Electron Microscopes (SEM's), Atomic Force Microscopes (AFM's) and Light Microscopes (LM's). The dual leadscrew design symmetrically loads samples while keeping them centered within the microscope's field of view.

For more details, please Contact MCube Technologies or visit MTI Instruments website

Manufacturing Contact/Proximity and Projection Mask Aligners for over 30 years. NXQ offers a full line of Automated Production, Research/Development and Custom systems. Founded in 1989, Neutronix has become widely recognized as the premier supplier of both remanufactured and re-engineered photolithography systems. Since 1978, Quintel has been a supplier of mask alignment systems for the semiconductor and microelectronics industry. In 2005, Neutronix merged with Quintel, forming NeutroniX-Quintel bringing together over 45 years of combined mask aligner experience!

Neutronix Quintel provides Double-side Mask Aligners with optionally integrated Nanoimprint lithography/ Bonder for Photolithography, MEMS, Microelectronics, Microfluidics, LED, Semiconductor & Solar applications

For more details, please Contact MCube Technologies or visit Neutronix Quintel website

Nanolithosolution provides a revolutionary one step Auto Release™ nanoimprint lithography solution (UV-NIL) IMC-100 with sub-20nm resolution and overlay alignment. NTP-100 provides a mechanical platform for mounting nanoimprint module, customized LED UV curing source and an imaging subsystem. It precisely holds the imprint mold and wafer and accurately performs nanoimprinting and separation of the imprint mold with one easy step. Built on years of research at HP labs, NLS technology is easily and efficiently implemented. Any facility with microlithography capability can upgrade to nanolithography with no disruption to established process flow. A proven process backed by state of the art nanotechnology research, NLS solution is the most cost effective in the industry.

For more details, please contact MCube Technologies or visit Nanolithosolution Incorporated website.